SC6301 Temporary Bonding Adhesive — Semiconductor-Grade, 280 °C PVD/CVD, Acid/Alkali pH1-13, Peel-Clean Removal
QUALITY CONTROL100% Lab Tested
DISPENSING SPECNordson Syringe
OUTER PACKAGINGVacuum-Sealed
PACKAGING SPEC30cc/syringe
Permeating the silicon matrix from the unseen

SC6301 Temporary Bonding Adhesive — Semiconductor-Grade, 280 °C PVD/CVD, Acid/Alkali pH1-13, Peel-Clean Removal

Temporary bonding series. 280 °C reflow/PVD/CVD compatible. pH 1–13 acid/alkali 60-min. Low modulus, high elongation, elastic peel-clean removal. Multiple viscosities.

Typical Application

Semiconductor process, PVD/CVD, wet-process plating, chips, PCBA and wafers — temporary protection, masking and bonding.

Technical Specifications
Tensile Modulus
2–14 MPa
Temperature Range
−45 °C–280 °C
Cure Condition
UV-cure 5 s
Elongation at Break
210–300 %
* Multiple specifications are available for this series
SCITEO Rigorous Standards: Qualified under GJB 150 environmental reliability testing by Zhenhua, CETC, and CAC, delivering mission-critical reliability.

Engineered as high-reliability domestic qualified alternatives for semiconductor and defense manufacturing clusters across Shanghai Zhangjiang, Xi'an, Chengdu, and Wuxi.

SCITEO R&D ARCHIVE

Specifications Don't Match Your Operating Conditions?

Only the baseline series is shown here. SCITEO's undisclosed archive holds formulations engineered for extreme environments. Contact us — our application engineers will match you precisely.

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APPLICATION FIELDS

High Reliability Scenarios

Core positioning and partial application demonstration of this product under complex operating conditions.

SCITEO SC6301 temporary bonding adhesive for wafer-fab localized masking

Wafer Fab Masking

SCITEO SC6301 temporary bonding adhesive for PCBA chip module temporary bonding, removable

Temporary PCBA Bonding

SCITEO SC6301 temporary protection for wafer-fab critical-dimension calibration wafer temporary protection

Wafer Fab Fixture Protection

FAQ & ENGINEERING ANSWERS

Application Engineer FAQ

A structured brief from SCITEO covering physical properties, application standards, and related specifications.

Q

How does SC6301 protect chip surface patterns during PVD/CVD and strong acid/alkali etching?

A

A dense hydrophobic barrier with strong interfacial anchoring withstands PVD transient heat at very low outgassing; there is no edge undercut across pH 1–13 wet cycles, and specific polar solvents give high-cohesion sheet peel-off.

Q

Why no thermal degradation through multiple reflow passes? How is residue-free removal achieved?

A

The series offers over 285 °C of short-term thermal headroom: after repeated lead-free reflow shocks the backbone neither chars nor embrittles, and 210–300% elongation at very low peel force allows clean removal with precision tweezers.

Engineering Support

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