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SC6301 Temporary Bonding Adhesive — Semiconductor-Grade, 280°C PVD/CVD, Acid/Alkali pH1-13, Peel-Clean Removal
SCITEO LAB TRUST100% Lab Tested
DISPENSING HARDWARENordson Syringe
VACUUM PACKAGINGVacuum Syringe Packaging
PACKAGINGPackaging: 30cc/syringe
Permeating the silicon matrix from the unseen

Precision Molecular Engineering

SC6301 Temporary Bonding Adhesive — Semiconductor-Grade, 280°C PVD/CVD, Acid/Alkali pH1-13, Peel-Clean Removal

Temporary bonding series. 280°C reflow/PVD/CVD compatible. pH 1–13 acid/alkali 60-min. Low modulus, high elongation, elastic peel-clean removal. Multiple viscosities.

Typical Application

Semiconductor fab, PVD/CVD, wet electroplating, chips, PCBA, wafers — temporary bonding, protection, masking & temporary bonding.

Technical Specifications
Tensile Modulus
2–14 MPa
Temp Range
−45°C – 280°C
Cure Condition
UV-cure 5s
Elongation at Break
210–300%
* Multiple specifications are available for this series.
SCITEO Rigorous Standards: Certified via GJB150 testing by Zhenhua, CETC, and CAC, providing reliable support.

This product provides local substitution for Shanghai Zhangjiang High-Tech Park, Xi'an & Chengdu military industrial bases, and Wuxi packaging industrial cluster.

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APPLICATION FIELDS

High Reliability Scenarios

Core positioning and partial application demonstration of this product under complex operating cycles.

SCITEO SC6301 temporary bonding adhesive for metal mask localized masking

Temporary bonding for metal stencil

SCITEO SC6301 temporary bonding adhesive for PCBA chip module temporary bonding, removable

Temporary bonding for PCBA

SCITEO SC6301 temporary protection for lithography/etching critical dimension calibration test wafer temporary protection

Temporary protection for lithography fixtures

FAQ & ENGINEERING ANSWERS

Application Engineer FAQ

SCITEO's structured answers regarding physical properties, industry standards, operating procedures, and technical specifications.

Q

How does SC6301 protect chip surface patterns during PVD/CVD and strong acid/alkali etching?

A

High-crosslink-density anti-penetration barrier. Withstands PVD transient high heat with extremely low outgassing. Zero edge undercut in pH 1–13 wet cycles. High-cohesion swell peel-off in specific polar solvents — zero pattern damage.

Q

Why no thermal degradation through multiple reflow passes? How is residue-free removal achieved?

A

>285°C short-term headroom. After multiple lead-free reflow thermal shocks: no charring or embrittlement. Ultra-high elongation + extremely low peel force — clean tweezer peel-off, zero pin residue.

SCITEO Application Engineering Support

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